Low resistance n-contact for UVC LEDs by a two-step plasma etching process
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چکیده
منابع مشابه
Novel two-step etching process for ion tracks in polyimide
Polyimide is of great technical importance because of its excellent material properties (including chemical inertness and radiation resistance) which are maintained even at low and at high temperatures. When thin polyimide foils are irradiated with energetic heavy ions, long nanometric tracks are formed. Under suitable conditions, the damaged material along these tracks is dissolved and develop...
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ژورنال
عنوان ژورنال: Semiconductor Science and Technology
سال: 2020
ISSN: 0268-1242,1361-6641
DOI: 10.1088/1361-6641/ab9ea7